Ascentool founders developed the top market share PVD and PECVD equipment in the industry. We offer high target utilization sputtering source on round target (80% utilization) and rectangular target (60-80% utilization), and high througput platforms for substrate processing.
Ascentool developed many "best against nature" IP and products to reach near 100% material utilization at small fraction of capital equipment cost. We have been selling equipment and production lines since 2005.
We can typically propose better solutions and sometimes perfect solution based on customer needs, due to our extensive device, engineering skills and industrial experience. These experiences also avoid most of the mistakes and delays in product development.
Small in-line system, large in-line system, and large batch system
Small scanning source, large scanning sources, circular planar target with very high target utilization, vertical in-line system, and solar production line
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